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Title:
Effect of fluorine implantation dose on boron thermal diffusion in silicon
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Journal of Applied Physics [0021-8979] El Mubarek, H. A. W. yr:2004
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author:
El Mubarek, H. A. W.
Bonar, J M
Dilliway, G D
Ashburn, P
Karunaratne, M
Willoughby, A F
Wang, Y
Price, R
Zhang, J
Ward, P
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author:
El Mubarek, H. A. W.
Bonar, J M
Dilliway, G D
Ashburn, P
Karunaratne, M
Willoughby, A F
Wang, Y
Price, R
Zhang, J
Ward, P
last name
initials
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author:
El Mubarek, H. A. W.
Bonar, J M
Dilliway, G D
Ashburn, P
Karunaratne, M
Willoughby, A F
Wang, Y
Price, R
Zhang, J
Ward, P
last name
initials
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