ExLibris header image
SFX Logo
Title: Image force effects in metal‐oxide‐semiconductor solar cells
Source:

Journal of Applied Physics [0021-8979] Ojha, V N yr:1982


Collapse list of basic services Basic
Full text
Full text available via AIP Digital Archive
GO
Document delivery
Request document via Library/Bibliothek GO
Users interested in this article also expressed an interest in the following:
1. TUGULEA, A. "THE IMAGE-FORCE EFFECT AT A METAL-SEMICONDUCTOR CONTACT WITH AN INTERFACIAL INSULATOR LAYER." Journal of applied physics 56.10 (1984): 2823-2891. Link to Full Text for this item Link to SFX for this item
2. Wen, H. "Image force effects and the dielectric response of SiO2 in electron transport across metal-oxide-semiconductor structures." Journal of vacuum science & technology. A. Vacuum, surfaces, and films 15.3 (1997): 784-789. Link to SFX for this item
3. Cova, P. "A self-consistent technique for the analysis of the temperature dependence of current-voltage and capacitance-voltage characteristics of a tunnel metal-insulator-semiconductor structure." Journal of applied physics 82.10 (1997): 5217-5226. Link to Full Text for this item Link to SFX for this item
Select All Clear All

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.