ExLibris header image
SFX Logo
Title: Supershallow levels in indium‐doped silicon
Source:

Journal of Applied Physics [0021-8979] Cerofolini, G F yr:1985


Collapse list of basic services Basic
Full text
Full text available via AIP Digital Archive
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.