ExLibris header image
SFX Logo
Title: Oxygen migration at Pt/HfO2/Pt interface under bias operation
Source:

Applied Physics Letters [0003-6951] Nagata, T yr:2010


Collapse list of basic services Basic
Full text
Full text available via AIP Journals (American Institute of Physics)
GO
Document delivery
Request document via Library/Bibliothek GO
Users interested in this article also expressed an interest in the following:
1. Crock, M. "Judicial review and part 8 of the Migration Act: necessary reform or overkill?(Australia)." Sydney law review 18.3 (1996): 267-. Link to SFX for this item
2. Kawasaki, T. "Improvement of windowed type environmental-cell transmission electron microscope for in situ observation of gas-solid interactions." Review of scientific instruments 80.11 (2009): 113701-. Link to Full Text for this item Link to SFX for this item
3. Fillot, F. "Investigations of the interface stability in HfO2-metal electrodes." Microelectronic Engineering 70.2-4 (2003): 384-391. Link to SFX for this item
4. Abecassis, B. "Gold nanoparticle superlattice crystallization probed in situ." Physical review letters 100.11 (2008): 115504-. Link to Full Text for this item Link to SFX for this item
5. Píš, I. "Application of Cr Kα X-ray photoelectron spectroscopy system to overlayer thickness determination." Surface and interface analysis 43.13 (2011): 1632-1635. Link to Full Text for this item Link to SFX for this item
6. "Physical Anthropology." Abstracts in anthropology 70.2 (2015): 266-375. Link to SFX for this item
7. García, H. "Influence of growth and annealing temperatures on the electrical properties of Nb2O5-based MIM capacitors." Semiconductor science and technology 28.5 (2013): 1-5. Link to Full Text for this item Link to SFX for this item
8. Platt, C. "Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers." Thin Solid Films 518.15 (2010): 4081-4086. Link to SFX for this item
9. Goldstein, D. "Enhancing the nucleation of palladium atomic layer deposition on Al2O3 using trimethylaluminum to prevent surface poisoning by reaction products." Applied physics letters 95.14 (2009): 143106-. Link to Full Text for this item Link to SFX for this item
10. Ueda, K. "First observation of dynamic shape changes of a gold nanoparticle catalyst under reaction gas environment by transmission electron microscopy." Surface and interface analysis 40.13 (2008): 1725-1727. Link to Full Text for this item Link to SFX for this item
11. Senzaki, Y. "Atomic layer deposition of high k dielectric and metal gate stacks for MOS devices." AIP conference proceedings 788.1 (2005): 69-72. Link to SFX for this item
12. "Cultural Anthropology." Abstracts in anthropology 69.3 (2014): 440-589. Link to SFX for this item
13. Li, K. "Tetrakis(ethylmethylamido) Hafnium Adsorption and Reaction on Hydrogen-Terminated Si(100) Surfaces." The journal of physical chemistry. C 115.38 (2011): 18560-18571. Link to Full Text for this item Link to SFX for this item
14. Farrell, D. "Abstracts accepted for publication only." Clinical microbiology and infection 14.s3 (2008): 716-844. Link to Full Text for this item Link to SFX for this item
15. Aaltonen, T. "Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature." Journal of materials research 19.11 (2004): 3353-3358. Link to SFX for this item
16. Verlaan, V. "Composition and bonding structure of plasma-assisted ALD Al2O3 films." Physica status solidi. C, Current topics in solid state physics 2010. 976-979. Link to SFX for this item
17. Wu, I. "Metal-insulator-metal tunneling diode for uncooled infrared high-speed detectors." Proceedings of SPIE--the international society for optical engineering 2010. 76792-. Link to SFX for this item
18. van Benthem, K. "Atomic and Electronic Structure Investigations of HfO2/SiO2/Si Gate Stacks Using Aberration-Corrected STEM." AIP conference proceedings 788.1 (2005): 79-. Link to SFX for this item
19. Kolanek, K. "In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope." Thin solid films 2010. 4688-4691. Link to SFX for this item
20. Rastorguev, A. "Photoluminescence study of the electronic structure of HfO2 films." Journal of structural chemistry 49.1 (2008): 21-30. Link to Full Text for this item Link to SFX for this item
View More...
View Less...
Select All Clear All

Expand list of advanced services Advanced