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Title:
Nanometer-scale resolution of a chloromethylated calixarene negative resist in electron-beam lithography: Dependence on the number of phenolic residues
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Applied Physics Letters [0003-6951] Sakamoto, T yr:2000
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Sakamoto, T
Manako, S
Fujita, J
Ochiai, Y
Baba, T
Yamamoto, H
Teshima, T
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author:
Sakamoto, T
Manako, S
Fujita, J
Ochiai, Y
Baba, T
Yamamoto, H
Teshima, T
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author:
Sakamoto, T
Manako, S
Fujita, J
Ochiai, Y
Baba, T
Yamamoto, H
Teshima, T
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