ExLibris header image
SFX Logo
Title: Formation of Cu diffusion channels in Ta layer of a Cu/Ta/SiO2/Si structure
Source:

Applied Physics Letters [0003-6951] Li, S yr:2002


Collapse list of basic services Basic
Full text
Full text available via AIP Journals (American Institute of Physics)
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.