Language
English
German
^M
Dutch
Spanish
Title:
Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone
Source:
Journal of Physical Chemistry C [1932-7447] Rose, Martin yr:2009
Basic
Full text
Full text available via
American Chemical Society Journals
Year:
Volume:
Issue:
Start Page:
Document delivery
Request document via
Library/Bibliothek
Users interested in this article also expressed an interest in the following:
description
1.
Rooth, M.
"Atomic layer deposition of iron oxide thin films and nanotubes using ferrocene and oxygen as precursors."
Chemical vapor deposition
14.3-4 (2008): 67-70.
description
2.
Kartavtseva, M. S.
"BiFeO3 thin films prepared by MOCVD."
Surface & coatings technology
201.22-23 (2007): 9149-9153.
description
3.
Scheffe, J.
"Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen."
Thin Solid Films
517.6 (2009): 1874-1879.
description
4.
Kubala, N.
"Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4."
The journal of physical chemistry. C
113.37 (2009): 16307-16310.
description
5.
Lee, S.
"Atomic layer deposition of silicon oxide thin films by alternating exposures to Si2Cl6 and O-3."
Electrochemical and solid-state letters
11.7 (2008): -6.
description
6.
Bachmann, J.
"Ordered iron oxide nanotube arrays of controlled geometry and tunable magnetism by atomic layer deposition."
Journal of the American Chemical Society
129.31 (2007): 9554-9555.
description
7.
KARTAVTSEVA, M. S.
"BiFeO3 thin films prepared using metalorganic chemical vapor deposition."
Thin Solid Films
515.16 (2007): 6416-6421.
description
8.
Ihanus, J.
"Atomic layer deposition of SrS and BaS thin films using cyclopentadienyl precursors."
Chemistry of materials
14.5 (2002): 1937-1944.
description
9.
Delabie, A.
"Atomic layer deposition of hafnium silicate gate dielectric layers."
Journal of vacuum science & technology. A, An international journal devoted to vacuum, surfaces, and films
25.4 (2007): 1302-1308.
description
10.
Kukli, K.
"Influence of atomic layer deposition parameters on the phase content of Ta2O5 films."
Journal of crystal growth
212.3-4 (2000): 459-468.
description
11.
Lim, Booyong S. S.
"Atomic layer deposition of transition metals."
Nature materials
2.11 (2003): 749-754.
description
12.
Zhu, S.
"Bias temperature instability in metal-oxide-semiconductor field-effect transistors with atomic-layer-deposited Si-nitride/SiO2 stack gate dielectrics."
Journal of applied physics
103.8 (2008): 84512-84512.
description
13.
Miya, H.
"High-quality HfO2 formation using Zr reduced high-purity TEMAH."
Electrochemical and solid-state letters
11.7 (2008).
description
14.
Wu, M.
"Electrochemical growth of iron oxide thin films with nanorods and nanosheets for capacitors."
Journal of the Electrochemical Society
156.9 (2009): -43.
description
15.
Evans, P.
"Characterisation of alumina-silica films deposited by ALD."
Surface and interface analysis
2006. 1692-1695.
description
16.
Monnier, D.
"Gaseous Phase Study of the Zr-Organometallic ALD Precursor TEMAZ by Mass Spectrometry."
Journal of the Electrochemical Society
156.1 (2009): -5.
description
17.
King, David M.
"In situ synthesis of TiO2-functionalized metal nanoparticles."
Industrial & engineering chemistry research
48.1 (2008): 352-360.
description
18.
Aarik, J.
"Influence of structure development on atomic layer deposition of TiO2 thin films."
Applied surface science
181.3-4 (2001): 339-348.
description
19.
Klaus, J. W.
"Atomically controlled growth of tungsten and tungsten nitride using sequential surface reactions."
Applied surface science
162 (2000): 479-491.
description
20.
Gosset, O. G.
"Interface and material characterization of thin Al2O3 layers deposited by ALD using TMA/H2O."
Journal of non-crystalline solids
303.1 (2002): 17-23.
View More...
View Less...
Select All
Clear All
Save Citations
Select Format
EndNote
RefWorks
Reference Manager
ProCite
Submit citation export
Advanced
Author
Other articles by this author? -- in
GeoRef
author:
Rose, Martin
Niinistö, Jaakko
Michalowski, Pawel
Gerlich, Lukas
Wilde, Lutz
Endler, Ingolf
Bartha, Johann W
last name
initials
Other articles by this author? -- in
Online Contents Geosciences
author:
Rose, Martin
Niinistö, Jaakko
Michalowski, Pawel
Gerlich, Lukas
Wilde, Lutz
Endler, Ingolf
Bartha, Johann W
last name
initials
Web Search
Find related information in
a Web Search Engine
Excite
Google
HotBot
Ixquick
ZOO
Ask
Yahoo!
Bing
Naver
Search Terms:
Search for related information in
Google Scholar
Article Title
Author Name
Journal Title
Other Search
Search Terms:
A service provided by the
Library of the Wissenschaftspark Albert Einstein
, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.