Abstract
Results are presented from experimental and theoretical studies of the efficiency of using a CO2 laser to create a high-power source of 13- to 14-nm EUV radiation for lithography. For a laser intensity of ∼2 × 1011 W/cm2, a conversion efficiency of k EUV ≃ 1.5% was achieved on a plane solid Sn target. The calculated gas dynamics and population kinetics of Sn plasma ions agree qualitatively with experimental results.
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Original Russian Text © G.S. Volkov, V.I. Zaitsev, K.N. Makarov, A.P. Napartovich, V.K. Rerikh, Yu.B. Smakovskii, A.E. Stepanov, V.E. Cherkovets, A.A. Rupasov, Yu.A. Satov, 2010, published in Fizika Plazmy, 2010, Vol. 36, No. 2, pp. 145–158.
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Volkov, G.S., Zaitsev, V.I., Makarov, K.N. et al. Study of the generation of the 13.5-nm EUV radiation from Sn ions in a CO2 laser-produced plasma. Plasma Phys. Rep. 36, 129–141 (2010). https://doi.org/10.1134/S1063780X10020042
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DOI: https://doi.org/10.1134/S1063780X10020042