Abstract
Novel volatile cyclooctatetraenyl-pentamethylcyclopentadienyl sandwich complexes have been used as precursors to deposit thin yttrium and rare earth oxide films by means of PECVD. These compounds form pure oxide films in plasmas of argon/oxygen or argon/water-vapour, in nitrous oxide, and carbon dioxide at substrate temperatures of 350–400° C and power densities of 1.0–1.5 W/cm2.
The films were characterized by metal analysis, carbon analysis, XPS, CTEM electron diffraction, SEM micrographs, and FTIR spectra.
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Weber, A., Suhr, H., Schumann, H. et al. Thin yttrium and rare earth oxide films produced by plasma enhanced CVD of novel organometallic π-complexes. Appl. Phys. A 51, 520–525 (1990). https://doi.org/10.1007/BF00324736
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DOI: https://doi.org/10.1007/BF00324736