ExLibris header image
SFX Logo
Title: Crystallization kinetics of boron- and germanium-implanted 〈100〉 Si: a balance between doping and strain effects
Source:

Thin Solid Films [0040-6090] Corni, F yr:1992


Collapse list of basic services Basic
Full text
Full text available via Elsevier SD Backfile Physics
GO
Full text available via EZB-NALI5-00465 Elsevier Archive NL
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced