ExLibris header image
SFX Logo
Title: Room-temperature, high-deposition-rate, plasma-enhanced chemical vapour deposition of silicon oxynitride thin films producing low surface damage on lattice-matched and pseudomorphic III–V quantum-well structures
Source:

Thin Solid Films [0040-6090] Sah, R E yr:1995


Collapse list of basic services Basic
Full text
Full text available via EZB-NALI5-00465 Elsevier Archive NL
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.