Electric field modified Arrhenius description of charge transport in amorphous oxide semiconductor thin film transistors

Wei Wang, Guangwei Xu, M. Delwar H. Chowdhury, Hong Wang, Jae Kwang Um, Zhuoyu Ji, Nan Gao, Zhiwei Zong, Chong Bi, Congyan Lu, Nianduan Lu, Writam Banerjee, Jiafeng Feng, Ling Li, Andrey Kadashchuk, Jin Jang, and Ming Liu
Phys. Rev. B 98, 245308 – Published 20 December 2018
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Abstract

While it is known that the charge-carrier mobility in amorphous metal oxide semiconductor thin film transistors (TFT) deviates from Arrhenius temperature dependence, we found that the Hall mobility measured in amorphous In-Ga-Zn-O (a-IGZO) follows an Arrhenius relation surprisingly well. We explain these observations by the effect of strong vertical electric field created by the gate voltage, which facilitates direct tunneling of trapped carriers into the conductive band and leads to virtually temperature independent mobility. We present a generalized Arrhenius model based on the effective temperature concept. We show that our model allows quantitative description of the temperature dependence of the mobility in a-IGZO TFTs over a broad temperature range.

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  • Received 28 February 2017
  • Revised 11 November 2018

DOI:https://doi.org/10.1103/PhysRevB.98.245308

©2018 American Physical Society

Physics Subject Headings (PhySH)

Polymers & Soft MatterCondensed Matter, Materials & Applied Physics

Authors & Affiliations

Wei Wang1,2, Guangwei Xu1,2, M. Delwar H. Chowdhury3, Hong Wang4, Jae Kwang Um3, Zhuoyu Ji1,2, Nan Gao1,2, Zhiwei Zong1,2, Chong Bi1,2, Congyan Lu1,2, Nianduan Lu1,2, Writam Banerjee1,2, Jiafeng Feng5, Ling Li1,2,*, Andrey Kadashchuk6,7, Jin Jang3, and Ming Liu1,2

  • 1Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing 100029, China
  • 2Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing 210009, China
  • 3Department of Information Display, Advanced Display Research Center, Kyung Hee University, Korea
  • 4Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, Xidian University, China
  • 5State Key Laboratory of Magnetism, Institute of Physics of Chinese Academy of Sciences, Beijing 100029, China
  • 6Institute of Physics, National Academy of Sciences of Ukraine, Prospect Nauky 46, 03028 Kyiv, Ukraine
  • 7IMEC, Kapeldreef 75, 3001 Leuven, Belgium

  • *lingli@ime.ac.cn

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Issue

Vol. 98, Iss. 24 — 15 December 2018

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