Ni2C surface carbide to catalyze low-temperature graphene growth

Rafael Martinez-Gordillo, Céline Varvenne, Hakim Amara, and Christophe Bichara
Phys. Rev. B 97, 205431 – Published 18 May 2018

Abstract

The possibility to grow a graphene layer using the chemical-vapor-deposition technique over a Ni2C/Ni(111) substrate has been identified experimentally, with the advantage of having a lower processing temperature (T<500C), compared to standard growth over a Ni(111) surface. To understand the role of the metal carbide/metal catalyst, we first perform a static study of the Ni2C/Ni(111) structure and of the binding and removal of a carbon atom at the surface, using both a tight-binding (TB) energetic model and ab initio calculations. Grand-canonical Monte Carlo TB simulations then allow us (i) to determine the thermodynamic conditions to grow graphene and (ii) to separate key reaction steps in the growth mechanism explaining how the Ni2C/Ni(111) substrate catalyzes graphene formation at low temperature.

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  • Received 16 October 2017
  • Revised 22 April 2018

DOI:https://doi.org/10.1103/PhysRevB.97.205431

©2018 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Rafael Martinez-Gordillo1, Céline Varvenne1, Hakim Amara2,*, and Christophe Bichara1

  • 1Aix Marseille Université–CNRS, CINaM, Campus de Luminy, 13288, Marseille, France
  • 2Laboratoire d'Etudes des Microstructures, ONERA-CNRS, Boîte Postale 72, 92322 Châtillon Cedex, France

  • *Corresponding author: hakim.amara@onera.fr

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Issue

Vol. 97, Iss. 20 — 15 May 2018

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