The Influence of NiO Addition in TiO₂ Structure and Its Photoactivity

The synthesis of TiO₂ together with the TiO₂-NiO composite using various annealing temperatures has been studied. The synthesis of TiO₂ was performed by sol gel method using Titanium Tetra Isopropoxide (TTIP) precursor, whereas the synthesis of TiO₂-NiO composite was done by wet impregnation method using NiNO₃.6H₂O precursor. This study aims to determine the influence of NiO addition in its structure and photoactivity. The diffraction of synthesized TiO₂ at 400 °C temperature shows anatase TiO₂ peak at 2θ = 25.35 °. The addition of NiO dopant to the synthesis of TiO₂ process is carried out by annealing at 300 °C, 400 °C, 500 °C, 600 °C, and 700 °C, respectively. The TiO₂-NiO composite has been prepared and shows the diffraction peak of NiO at 2θ=43° about 33.08 to 36.68%. The optimum result of Rhodamine B photodegradation with TiO₂ was 43.15%, while the optimum result of Rhodamine B degradation with TiO₂-NiO composite was 92.85%.