Abstract
We present here a first-principles study of the ternary compounds formed by Ni, In, and As, a material of great importance for self-aligned metallic contacts in next-generation InAs-based MOS transistors. The approach we outline is general and can be applied to study the crystal structure and properties of a host of other new interface compounds. Using the ab initio random structure searching approach we find the previously unknown low-energy structures of and assess their stability with respect to the known binary compounds of Ni, In, and As. Guided by experiments, we focus on and find a rich energy landscape for this stoichiometry. We consider the five lowest-energy structures, with space groups , and . The five low-energy structures for are all found to be metallic and nonmagnetic. By comparison to previously published TEM results we identify the crystal structure observed in experiments to be . We calculate the work function for and, according to the Schottky-Mott model, expect the material to form an Ohmic contact with InAs. We further explicitly consider the interface between and InAs and find it to be Ohmic with an Schottky barrier height of .
- Received 2 December 2014
- Revised 9 April 2015
DOI:https://doi.org/10.1103/PhysRevB.92.054105
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Published by the American Physical Society