Memory effect in a ferroelectric single-electron transistor: Violation of conductance periodicity in the gate voltage

S. A. Fedorov, A. E. Korolkov, N. M. Chtchelkatchev, O. G. Udalov, and I. S. Beloborodov
Phys. Rev. B 90, 195111 – Published 7 November 2014

Abstract

A fundamental property of most single-electron devices with a quasicontinuous quasiparticle spectrum on an island is the periodicity of their transport characteristics in a gate voltage. This property is robust even with respect to placing ferroelectric insulators in the source and drain tunnel junctions. We show that placing a ferroelectric insulator inside the gate capacitance breaks this periodicity. The current-voltage characteristics of this single-electron transistor strongly depends on the ferroelectric polarization and shows a giant memory effect even for negligible ferroelectric hysteresis making this device promising for memory applications.

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  • Received 27 August 2014
  • Revised 20 October 2014

DOI:https://doi.org/10.1103/PhysRevB.90.195111

©2014 American Physical Society

Authors & Affiliations

S. A. Fedorov1,2, A. E. Korolkov1,2, N. M. Chtchelkatchev1,3,4, O. G. Udalov3,5, and I. S. Beloborodov3

  • 1Department of Theoretical Physics, Moscow Institute of Physics and Technology, Moscow 141700, Russia
  • 2P.N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow 119991, Russia
  • 3Department of Physics and Astronomy, California State University Northridge, Northridge, California 91330, USA
  • 4L.D. Landau Institute for Theoretical Physics, Russian Academy of Sciences, Moscow 117940, Russia
  • 5Institute for Physics of Microstructures, Russian Academy of Science, Nizhny Novgorod, 603950, Russia

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Issue

Vol. 90, Iss. 19 — 15 November 2014

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