Tunneling spectroscopy of graphene-boron-nitride heterostructures

F. Amet, J. R. Williams, A. G. F. Garcia, M. Yankowitz, K. Watanabe, T. Taniguchi, and D. Goldhaber-Gordon
Phys. Rev. B 85, 073405 – Published 13 February 2012
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Abstract

We report on the fabrication and measurement of a graphene tunnel junction using hexagonal-boron nitride as a tunnel barrier between graphene and a metal gate. The tunneling behavior into graphene is altered by the interactions with phonons and the presence of disorder. We extract properties of graphene and observe multiple phonon-enhanced tunneling thresholds. Finally, differences in the measured properties of two devices are used to shed light on mutually contrasting previous results of scanning tunneling microscopy in graphene.

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  • Received 10 January 2012

DOI:https://doi.org/10.1103/PhysRevB.85.073405

©2012 American Physical Society

Authors & Affiliations

F. Amet1, J. R. Williams2, A. G. F. Garcia2, M. Yankowitz2, K. Watanabe3, T. Taniguchi3, and D. Goldhaber-Gordon2

  • 1Department of Applied Physics, Stanford University, Stanford, California 94305, USA
  • 2Department of Physics, Stanford University, Stanford, California 94305, USA
  • 3Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan

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Issue

Vol. 85, Iss. 7 — 15 February 2012

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