Abstract
The support of epitaxial films frequently determines their crystallographic orientation, which is of crucial importance for their properties. We report a novel way to alter the film orientation without changing the substrate. We show for the growth of CoO on the Ir(100) surface that, while the oxide grows in (111) orientation on the bare substrate, the orientation switches to (100) by introducing a single (or a few) monolayer(s) of Co between the oxide and substrate. This tunability of the orientation of epitaxial films by the appropriate choice of interface chemistry most likely is a general feature.
- Received 24 October 2011
DOI:https://doi.org/10.1103/PhysRevLett.108.066101
© 2012 American Physical Society