Tuning the Growth Orientation of Epitaxial Films by Interface Chemistry

Matthias Gubo, Christina Ebensperger, Wolfgang Meyer, Lutz Hammer, Klaus Heinz, Florian Mittendorfer, and Josef Redinger
Phys. Rev. Lett. 108, 066101 – Published 10 February 2012

Abstract

The support of epitaxial films frequently determines their crystallographic orientation, which is of crucial importance for their properties. We report a novel way to alter the film orientation without changing the substrate. We show for the growth of CoO on the Ir(100) surface that, while the oxide grows in (111) orientation on the bare substrate, the orientation switches to (100) by introducing a single (or a few) monolayer(s) of Co between the oxide and substrate. This tunability of the orientation of epitaxial films by the appropriate choice of interface chemistry most likely is a general feature.

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  • Received 24 October 2011

DOI:https://doi.org/10.1103/PhysRevLett.108.066101

© 2012 American Physical Society

Authors & Affiliations

Matthias Gubo, Christina Ebensperger, Wolfgang Meyer, Lutz Hammer, and Klaus Heinz

  • Lehrstuhl für Festkörperphysik, Universität Erlangen-Nürnberg, Staudtstraße 7, D-91058 Erlangen, Germany

Florian Mittendorfer* and Josef Redinger

  • Institut für Angewandte Physik and Center for Computational Materials Science, Technische Universität Wien, Gußhausstraße 25/134, A-1040 Wien, Austria

  • *fmi@cms.tuwien.ac.at

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Vol. 108, Iss. 6 — 10 February 2012

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