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Continuous phase and amplitude holographic elementsA method for producing a phase hologram using e-beam lithography provides n-ary levels of phase and amplitude by first producing an amplitude hologram on a transparent substrate by e-beam exposure of a resist over a film of metal by exposing n is less than or equal to m x m spots of an array of spots for each pixel, where the spots are randomly selected in proportion to the amplitude assigned to each pixel, and then after developing and etching the metal film producing a phase hologram by e-beam lithography using a low contrast resist, such as PMMA, and n-ary levels of low doses less than approximately 200 micro-C/sq cm and preferably in the range of 20-200 micro-C/sq cm, and aggressive development using pure acetone for an empirically determined time (about 6 s) controlled to within 1/10 s to produce partial development of each pixel in proportion to the n-ary level of dose assigned to it.
Document ID
19950019920
Acquisition Source
Legacy CDMS
Document Type
Other - Patent
Authors
Maker, Paul D. (NASA Pasadena Office CA, United States)
Muller, Richard E. (NASA Pasadena Office CA, United States)
Date Acquired
August 16, 2013
Publication Date
February 28, 1995
Subject Category
Instrumentation And Photography
Accession Number
95N26340
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
Patent
NASA-CASE-NPO-18791-1|US-PATENT-5,393,634
Patent Application
US-PATENT-APPL-SN-071131

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