An analytic model of axisymmetric mantle plume due to thermal and chemical diffusion

Liu, Mian; Chase, Clement G.

An analytic model of axisymmetric mantle plumes driven by either thermal diffusion or combined diffusion of both heat and chemical species from a point source is presented. The governing equations are solved numerically in cylindrical coordinates for a Newtonian fluid with constant viscosity. Instead of starting from an assumed plume source, constraints on the source parameters, such as the depth of the source regions and the total heat input from the plume sources, are deduced using the geophysical characteristics of mantle plumes inferred from modelling of hotspot swells. The Hawaiian hotspot and the Bermuda hotspot are used as examples. Narrow mantle plumes are expected for likely mantle viscosities. The temperature anomaly and the size of thermal plumes underneath the lithosphere can be sensitive indicators of plume depth. The Hawaiian plume is likely to originate at a much greater depth than the Bermuda plume. One suggestive result puts the Hawaiian plume source at a depth near the core-mantle boundary and the source of the Bermuda plume in the upper mantle, close to the 700 km discontinuity. The total thermal energy input by the source region to the Hawaiian plume is about 5 x 10(10) watts. The corresponding diameter of the source region is about 100 to 150 km. Chemical diffusion from the same source does not affect the thermal structure of the plume.

Document ID

19900010398

Acquisition Source

Legacy CDMS

Document Type

Contractor Report (CR)

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Date Acquired

September 6, 2013

Publication Date

January 1, 1990

Subject Category

Report/Patent Number

Accession Number

90N19714

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Public

Work of the US Gov. Public Use Permitted.

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