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An overview of CVD processesIn this review, chemical vapor deposition (CVD) processes under normal or reduced pressures are examined critically, since they are now in practical usage. Several problems, which arise in much broader applications, are pointed out. New processes of CVD are also described. Superior characteristics of CVD are taken into account and they are applied in practical use.
Document ID
19870005850
Acquisition Source
Legacy CDMS
Document Type
Reprint (Version printed in journal)
Authors
Okamoto, S.
(NASA Headquarters Washington, DC United States)
Date Acquired
September 5, 2013
Publication Date
August 1, 1986
Subject Category
Inorganic And Physical Chemistry
Report/Patent Number
NASA-TM-88450
NAS 1.15:88450
Accession Number
87N15283
Funding Number(s)
CONTRACT_GRANT: NASW-4004
Distribution Limits
Public
Copyright
Work of the US Gov. Public Use Permitted.
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