Design and fabrication of multilevel diffractive optical elements (DOEs) and holographic optical elements (HOEs)

https://doi.org/10.1016/0167-9317(93)90113-JGet rights and content

Abstract

In this report we describe the design, calculation and fabrication of binary and multilevel DOEs. In particular we pay attention to the direct write ebeam process and the pattern transfer into Si—substrates by reactive ion etching. First results can be given in terms of the diffraction efficiency and image quality of binary DOEs applied in test circuits for light coupling and free space light transfer with a multifunctional HOE.

References (6)

  • M. Hintermaier et al.

    Microelectronic Eng.

    (1991)
  • H. Zarschizky et al.

    SPIE

    (1992)
  • H. Karstensen

    J. Opt. Commun.

    (1988)
There are more references available in the full text version of this article.

Cited by (0)

View full text