Elsevier

Polyhedron

Volume 8, Issue 4, 1989, Pages 551-553
Polyhedron

Communication
New precursors for chemical vapour deposition of platinum and the hydrogen effect on cvd

https://doi.org/10.1016/S0277-5387(00)80758-5Get rights and content

Abstract

Volatile organoplatinum(II) complexes have been studied as precursors for low temperature chemical vapour deposition (CVD) of platinum films. The temperature of CVD and the carbon contamination of the films can both be decreased by conducting the CVD process in the presence of hydrogen. Good adherence of the films to a silicon semiconductor is obtained.

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