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UV desorption and photochemistry of dimethylgold hexafluoroacetylacetonate adsorbed on a quartz substrate

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Abstract

The photodesorption and photodecomposition pathways of dimethylgold hexafluoroacetylacetonate, DMG (hfac), adsorbed on a cooled quartz substrate is reported for 222-nm KrCl excimer laser radiation. The time-of-flight (TOF) of neutral photoproducts, desorbed from the surface of the gold film formed during the experiment, were analyzed under collisionless conditions by a differentially-pumped mass spectrometer. Extensive dissociation of adsorbed DMG (hfac) into DMG and the hfac ligand was observed. The ligand was found to recombine with a CH3 radical on the surface. Translational energy distributions for the detected species were obtained by deconvoluting the TOF curves into a self-consistent set of Maxwell-Boltzmann distributions for the desorbed parent molecule, laser-induced decomposition products, and surface recombination reaction products. The implications of these results for the mechanistic details of the low-pressure, laser-assisted organometallic deposition of DMG(hfac) are discussed.

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Authors and Affiliations

  1. National Institute of Standards and Technology, 20899, Gaithersburg, MD, USA

    J. A. Dagata

  2. Chemistry Division, Naval Research Laboratory, 20375-5000, Washington DC, USA

    E. Villa

  3. Department of Chemistry, Emory University, 30322, Atlanta, GA, USA

    M. C. Lin

Authors
  1. J. A. Dagata
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  2. E. Villa
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  3. M. C. Lin
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ONT/NRL Research Associate (Nov. 1987-Oct. 1988)

NRC/NRL Cooperative Research Associate

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Dagata, J.A., Villa, E. & Lin, M.C. UV desorption and photochemistry of dimethylgold hexafluoroacetylacetonate adsorbed on a quartz substrate. Appl. Phys. B 51, 443–450 (1990). https://doi.org/10.1007/BF00329109

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  • DOI: https://doi.org/10.1007/BF00329109

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