Abstract
Dielectric-barrier (silent) discharges are ideally suited for efficient excitation of high-intensity UV radiation from excimers. The molecular continuum of xenon at 172 nm could be obtained with an efficiency of close to 10%. Model calculations for excimer formation and UV efficiencies in such discharges are presented. The possibility of obtaining many other wavelengths (e.g. KrF* at 248 nm and XeCl* at 308 nm) and the variety of conceivable geometries (plane or cylindrical) makes this new UV source an attractive choice for many photophysical and photochemical applications.
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