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Epitaxial growth of metals with high Ehrlich–Schwoebel barriers and the effect of surfactants

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Abstract.

Interlayer diffusion in epitaxial systems with a high energy barrier at the atomic steps – the so-called Ehrlich–Schwoebel (ES) barrier – is strongly reduced. As a consequence of this, a continuous accumulation of roughness takes place during growth. This undesirable effect can be corrected by using surfactant agents. We have studied the influence of the ES barrier on the preparation of epitaxial films on Cu(111), and the surfactant effect of a monolayer of Pb.

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Authors and Affiliations

  1. Departamento de Física de la Materia Condensada and Instituto de Ciencia de Materiales “Nicolás Cabrera”, Universidad Autónoma de Madrid, Cantoblanco, 28049-Madrid, Spain, , , , , , ES

    J. Camarero, V. Cros, J. Álvarez, M.A. Niño, J.E. Prieto, A.L. Vázquez de Parga, J.J. de Miguel & R. Miranda

  2. European Synchrotron Radiation Facility, E.S.R.F., BP 220, F-38043 Grenoble Cedex, France, , , , , , FR

    M.J. Capitán & S. Ferrer

  3. Instituto de Física Rosario, 2000-Rosario, Argentina, , , , , , AR

    L. Gómez

  4. INTEC-CONICET, Universidad Nacional del Litoral, 3000-Santa Fe, Argentina, , , , , , AR

    J. Ferrón

  5. Instituto de Ciencia de Materiales, (CSIC), Cantoblanco, 28049-Madrid, Spain, , , , , , ES

    J.M. Gallego

Authors
  1. J. Camarero
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  2. V. Cros
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  3. M.J. Capitán
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  4. J. Álvarez
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  5. S. Ferrer
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  6. M.A. Niño
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  7. J.E. Prieto
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  8. L. Gómez
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  9. J. Ferrón
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  10. A.L. Vázquez de Parga
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  11. J.M. Gallego
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  12. J.J. de Miguel
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  13. R. Miranda
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Additional information

Received: 21 April 1999 / Accepted: 17 August 1999 / Published online: 6 October 1999

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Camarero, J., Cros, V., Capitán, M. et al. Epitaxial growth of metals with high Ehrlich–Schwoebel barriers and the effect of surfactants. Appl Phys A 69, 553–557 (1999). https://doi.org/10.1007/s003390051469

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  • DOI: https://doi.org/10.1007/s003390051469

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