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Surface and volume decay processes in semiconductors studied by contactless transient photoconductivity measurements

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Abstract

Excess charge carrier kinetics in moderately doped pSi wafers were investigated with a contactless transient photoconductivity method, i.e. the time-resolved microwave conductivity (TRMC) method. The surface structure of the wafers was changed by etching and polishing, the volume structure by irradiation with high-energy electrons. Comparison of the photoconductivity decay after excitation by strongly absorbed light and by weakly absorbed light was used to distinguish between surface and volume decay processes. The experimental results deviate from predictions based on a linear surface decay rate. These results are discussed and suggestions are made for the use of transient photoconductivity measurements to characterize semiconductor wafers.

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Authors and Affiliations

  1. Hahn-Meitner-Institut, Glienickerstrasse 100, D-1000, Berlin 39

    M. Kunst, G. Müller, R. Schmidt & H. Wetzel

Authors
  1. M. Kunst
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  2. G. Müller
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  3. R. Schmidt
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  4. H. Wetzel
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Kunst, M., Müller, G., Schmidt, R. et al. Surface and volume decay processes in semiconductors studied by contactless transient photoconductivity measurements. Appl. Phys. A 46, 77–85 (1988). https://doi.org/10.1007/BF00615912

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  • DOI: https://doi.org/10.1007/BF00615912

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