Abstract
Structural properties and spatial inhomogeneity of MOCVD-grown AlxGa1−x N layers on (0001) sapphire substrates were studied. A nonuniform distribution of Al across the epilayer was observed in layers grown at constant flux rates of precursors. The model of compositionally graded layer formation is proposed on the basis of cathodoluminescence and X-ray data. It is established that homogeneous samples can be obtained by increasing the flux rate of trimethylaluminum at the initial stage of epilayer growth compared with that in all further stages. Lowering the growth rate reduces strain in epitaxial AlxGa1−x N layers. The influence of strain on the luminescence properties of the layers is discussed.
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F. Omnes, N. Marenco, B. Beaumont, et al., J. Appl. Phys. 86, 5286 (1999).
I. Akasaki and H. Amano, Jpn. J. Appl. Phys. 36, 5393 (1997).
I. L. Krestnikov, W. V. Lundin, A. V. Sakharov, et al., Phys. Status Solidi B 216, 511 (1999).
T. J. Kistenmacher, D. K. Wickenden, M. E. Hawley, and R. P. Leavitt, Appl. Phys. Lett. 67, 3771 (1995).
A. V. Polyakov, A. V. Govorkov, N. B. Smirnov, et al., Solid-State Electron. 42, 637 (1998).
A. V. Polyakov, M. Shin, J. A. Freitas, et al., J. Appl. Phys. 80, 6349 (1996).
C. G. van de Walle, C. Stampfl, J. Neugebauer, et al., MRS Internet J. Nitride Semicond. Res. 4S1, G10.4 (1999).
H. Angerer, D. Brunner, F. Freudenberg, et al., Appl. Phys. Lett. 71, 1504 (1997).
A. S. Zubrilov, D. V. Tsvetkov, V. I. Nikolaev, and I. P. Nikitina, Fiz. Tekh. Poluprovodn. (St. Petersburg) 30, 2051 (1996) [Semiconductors 30, 1069 (1996)].
A. M. Tsaregorodtsev and A. N. Efimov, Pis’ma Zh. Tekh. Fiz. 22(3), 86 (1996) [Tech. Phys. Lett. 22, 130 (1996)].
G. Steude, T. Christmann, B. K. Meyer, et al., MRS Internet J. Nitride Semicond. Res. 4S1, G3.26 (1999).
T. G. Mihopoulos, V. Gupta, and K. F. Jensen, J. Cryst. Growth 195, 733 (1998).
S. Ruffenach-Clur, O. Briot, B. Gil, and R.-L. Aulombard, MRS Internet J. Nitride Semicond. Res. 2, article 27 (1997).
F. Nukamura, S. Hashimoto, M. Hara, et al., J. Cryst. Growth 195, 280 (1998).
J. Christen, T. Hempel, F. Bertram, et al., Physica E (Amsterdam) 2, 557 (1998).
D. Kapolnek, X. H. Wu, B. Heying, et al., Appl. Phys. Lett. 67, 1541 (1995).
A. V. Bobyl’, R. N. Kyutt, and V. V. Tretyakov, Semicond. Sci. Technol. 14, 589 (1999).
A. S. Usikov, V. V. Ratnikov, R. Kyutt, et al., MRS Internet J. Nitride Semicond. Res. 3, 42 (1998).
W. V. Lundin, A. S. Usikov, B. V. Pushnyi, et al., in Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides and Related Materials-97, Stockholm, 1997, Part 2, p. 1315.
K. Hiramatsu, Y. Kawaguchi, M. Shimizu, et al., MRS Internet J. Nitride Semicond. Res. 2, article 6 (1997).
I. Akasaki, H. Amano, Y. Koide, et al., J. Cryst. Growth 98, 209 (1989).
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Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 34, No. 11, 2000, pp. 1300–1306.
Original Russian Text Copyright © 2000 by Usikov, Tret’yakov, Bobyl’, Kyutt, Lundin, Pushny\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\), Shmidt.
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Usikov, A.S., Tret’yakov, V.V., Bobyl’, A.V. et al. Internal microstrain and distribution of composition and cathodoluminescence over lapped AlxGa1−x N epilayers on sapphire. Semiconductors 34, 1248–1254 (2000). https://doi.org/10.1134/1.1325417
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DOI: https://doi.org/10.1134/1.1325417