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Internal microstrain and distribution of composition and cathodoluminescence over lapped AlxGa1−x N epilayers on sapphire

  • Atomic Structure and Nonelectronic Properties of Semiconductors
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Abstract

Structural properties and spatial inhomogeneity of MOCVD-grown AlxGa1−x N layers on (0001) sapphire substrates were studied. A nonuniform distribution of Al across the epilayer was observed in layers grown at constant flux rates of precursors. The model of compositionally graded layer formation is proposed on the basis of cathodoluminescence and X-ray data. It is established that homogeneous samples can be obtained by increasing the flux rate of trimethylaluminum at the initial stage of epilayer growth compared with that in all further stages. Lowering the growth rate reduces strain in epitaxial AlxGa1−x N layers. The influence of strain on the luminescence properties of the layers is discussed.

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References

  1. F. Omnes, N. Marenco, B. Beaumont, et al., J. Appl. Phys. 86, 5286 (1999).

    ADS  Google Scholar 

  2. I. Akasaki and H. Amano, Jpn. J. Appl. Phys. 36, 5393 (1997).

    Article  Google Scholar 

  3. I. L. Krestnikov, W. V. Lundin, A. V. Sakharov, et al., Phys. Status Solidi B 216, 511 (1999).

    Google Scholar 

  4. T. J. Kistenmacher, D. K. Wickenden, M. E. Hawley, and R. P. Leavitt, Appl. Phys. Lett. 67, 3771 (1995).

    Article  ADS  Google Scholar 

  5. A. V. Polyakov, A. V. Govorkov, N. B. Smirnov, et al., Solid-State Electron. 42, 637 (1998).

    Google Scholar 

  6. A. V. Polyakov, M. Shin, J. A. Freitas, et al., J. Appl. Phys. 80, 6349 (1996).

    Article  ADS  Google Scholar 

  7. C. G. van de Walle, C. Stampfl, J. Neugebauer, et al., MRS Internet J. Nitride Semicond. Res. 4S1, G10.4 (1999).

  8. H. Angerer, D. Brunner, F. Freudenberg, et al., Appl. Phys. Lett. 71, 1504 (1997).

    Article  ADS  Google Scholar 

  9. A. S. Zubrilov, D. V. Tsvetkov, V. I. Nikolaev, and I. P. Nikitina, Fiz. Tekh. Poluprovodn. (St. Petersburg) 30, 2051 (1996) [Semiconductors 30, 1069 (1996)].

    Google Scholar 

  10. A. M. Tsaregorodtsev and A. N. Efimov, Pis’ma Zh. Tekh. Fiz. 22(3), 86 (1996) [Tech. Phys. Lett. 22, 130 (1996)].

    Google Scholar 

  11. G. Steude, T. Christmann, B. K. Meyer, et al., MRS Internet J. Nitride Semicond. Res. 4S1, G3.26 (1999).

  12. T. G. Mihopoulos, V. Gupta, and K. F. Jensen, J. Cryst. Growth 195, 733 (1998).

    Google Scholar 

  13. S. Ruffenach-Clur, O. Briot, B. Gil, and R.-L. Aulombard, MRS Internet J. Nitride Semicond. Res. 2, article 27 (1997).

  14. F. Nukamura, S. Hashimoto, M. Hara, et al., J. Cryst. Growth 195, 280 (1998).

    Google Scholar 

  15. J. Christen, T. Hempel, F. Bertram, et al., Physica E (Amsterdam) 2, 557 (1998).

    ADS  Google Scholar 

  16. D. Kapolnek, X. H. Wu, B. Heying, et al., Appl. Phys. Lett. 67, 1541 (1995).

    Article  ADS  Google Scholar 

  17. A. V. Bobyl’, R. N. Kyutt, and V. V. Tretyakov, Semicond. Sci. Technol. 14, 589 (1999).

    ADS  Google Scholar 

  18. A. S. Usikov, V. V. Ratnikov, R. Kyutt, et al., MRS Internet J. Nitride Semicond. Res. 3, 42 (1998).

    Google Scholar 

  19. W. V. Lundin, A. S. Usikov, B. V. Pushnyi, et al., in Proceedings of the 7th International Conference on Silicon Carbide, III-Nitrides and Related Materials-97, Stockholm, 1997, Part 2, p. 1315.

  20. K. Hiramatsu, Y. Kawaguchi, M. Shimizu, et al., MRS Internet J. Nitride Semicond. Res. 2, article 6 (1997).

  21. I. Akasaki, H. Amano, Y. Koide, et al., J. Cryst. Growth 98, 209 (1989).

    Article  Google Scholar 

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Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 34, No. 11, 2000, pp. 1300–1306.

Original Russian Text Copyright © 2000 by Usikov, Tret’yakov, Bobyl’, Kyutt, Lundin, Pushny\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\), Shmidt.

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Usikov, A.S., Tret’yakov, V.V., Bobyl’, A.V. et al. Internal microstrain and distribution of composition and cathodoluminescence over lapped AlxGa1−x N epilayers on sapphire. Semiconductors 34, 1248–1254 (2000). https://doi.org/10.1134/1.1325417

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  • DOI: https://doi.org/10.1134/1.1325417

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