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NMR in pure3He films on a Nuclepore substrate

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Abstract

The properties of3He films on a Nuclepore substrate have been measured by pulsed NMR at a Larmor frequency of 10 MHz between 1.3 and 4.2 K. The3He film thickness was varied from 0.14 to 2 layers. The spin-spin relaxation timeT 2 agrees well with previous measurements of3He films on Mylar and Vycor glass at low temperatures. The spin-lattice relaxation timeT 1 for submonolayer films shows a strong temperature dependence consistent with a thermally activated process. This behavior has not previously been observed on amorphous substrates. The spin diffusion coefficient was measured for the thickest films at 4.2 and 2.6 K and found to be consistent with free atom motion of the3He in the vapor. In thin films or at low temperatures, the diffusion was too small to be observed. The magnetic coupling between the3He nuclei in a film and the protons in the Nuclepore substrate was determined from the effect of the3He on the proton-lattice relaxation time. It is about 100 times weaker than the interaction between3He and the fluorine nuclei in a Teflon substrate.

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Swanson, D.R., Candela, D. & Edwards, D.O. NMR in pure3He films on a Nuclepore substrate. J Low Temp Phys 72, 213–239 (1988). https://doi.org/10.1007/BF00682097

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