Summary
The results obtained by cross-sectional technique applied to Si+-implanted GaAs crystals, thinned by Ar+-milling, are presented. The effects of the disordered layers produced by Ar+-milling have been estimated through high-resolution transmission electron microscopy (HRTEM).
Riassunto
Nel presente lavoro si mostrano alcuni risultati riguardanti lo studio del danno provocato dal bombardamento con Ar+ durante l'assottigliamento di campioni di GaAs impiantato con Si+. Gli effetti prodotti da tale tecnica sono stati osservati e valutati su sezioni trasversali dei campioni tramite microscopia elettronica ad alta risoluzione (HRTEM).
Резюме
Приводятся результаты исследования влияния Ar+-бомбаровки в процессе утончения кристаллов GaAs, имплантированных Si+. Используя трансмиссионную электронную микроскопию высокого разрешения, оцениваются эффекты, связанные с разупорядочением слоев при Ar+-бомбардировке.
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Vitali, G., Rossi, M., Kalitzova, M. et al. Influence of Ar-milling on cross-section structure of gallium arsenide. Il Nuovo Cimento D 10, 221–227 (1988). https://doi.org/10.1007/BF02450100
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DOI: https://doi.org/10.1007/BF02450100