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Magnetic structure of Fe−Si−Al films implanted with Al and N ions

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Abstract

Changes in the magnetic structure of Fe−Si−Al films due to Al and N ion implantation were studied by57Fe Conversion Electron Mössbauer Spectrometry (CEMS). The peaks of the magnetic sextets due to the crystalline films became broader by implantation with 5×1016 Al/cm2, suggesting the formation of amorphous phases. In the CEM spectrum of one sample with large grains implanted with 1×1017 Al/cm2 a crystalline α-Fe phase appeared. N implantation with the same dose did not amorphize the sample but the components with high magnetic hyperfine fields were enhanced.

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Authors and Affiliations

  1. Faculty of Engineering, The University of Tokyo, Hongo 7-3-1, Bunkyo-ku, 113, Tokyo, Japan

    K. Nomura

  2. Institut für lonenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf e.V, Postfach 510119, D-01314, Dresden, Germany

    H. Reuther & E. Richter

  3. Research Center for Advanced Science and Technology, The University of Tokyo, Komaba 4-6-1, Meguro-ku, 153, Tokyo, Japan

    Y. Ujihira

Authors
  1. K. Nomura
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  2. H. Reuther
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  3. E. Richter
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  4. Y. Ujihira
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Nomura, K., Reuther, H., Richter, E. et al. Magnetic structure of Fe−Si−Al films implanted with Al and N ions. Journal of Radioanalytical and Nuclear Chemistry, Articles 190, 299–313 (1995). https://doi.org/10.1007/BF02040005

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