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Ductility and stress relaxation kinetics in a silicon nitride ceramic in the 1400–1650°C range

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Journal of Materials Science Letters

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Authors and Affiliations

  1. ENSCI, LMCTS, UPRESA-CNRS 6015, 47 Av. A. Thomas, 87065, Limoges cedex, France

    S. Testu & J.-L. Besson

  2. Laboratoire “Verres et Céramiques”, UMR-CNRS 6512, Université de Rennes 1, Campus Beaulieu, 35042, Rennes cedex, France

    T. Rouxel

  3. Céramiques Techniques Desmarquest, Saint-Gobain, Usine d'Evreux, ZI n°1, rue de l'industrie, 27025, Evreux cedex, France

    G. Bernard-Granger

Authors
  1. S. Testu
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  2. J.-L. Besson
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  3. T. Rouxel
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  4. G. Bernard-Granger
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Testu, S., Besson, JL., Rouxel, T. et al. Ductility and stress relaxation kinetics in a silicon nitride ceramic in the 1400–1650°C range. Journal of Materials Science Letters 19, 1007–1010 (2000). https://doi.org/10.1023/A:1006749129216

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  • DOI: https://doi.org/10.1023/A:1006749129216

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