Skip to main content
SpringerLink
Log in

The Role of Sulfur During Mo Etching Using SF6 and Cl2 Gas Chemistries

  • Published:
Journal of Materials Science Letters

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

References

  1. H. Kotaki, M. Nakano, S. Hayashida, S. Kakimoto, K. Mitsuhashi and J. Takagi, Jpn. J. Appl. Phys. 34 (1995) 776.

    Google Scholar 

  2. S. P. Murarka, “Metallization; theory and practice for VLSI and ULSI” (Butterworth-Heinemann, 1993).

  3. M. J. Kim and D. M. Brown, IEEE, Trans. Electron. Devices ED-30 (1983) 598.

    Google Scholar 

  4. T. P. Chow, D. M. Brown, A. J. Steckl and M. Garfinkel, J. Appl. Phys. 51 (1980) 5981.

    Google Scholar 

  5. K. Ninomiya, K. Suzuki, S. Nishimatsu and O. Okada, ibid. 64 (1987) 1459.

    Google Scholar 

  6. G. Turban, J. F. Coulon and M. Mutsukura, Thin Solid Films 176 (1989) 289.

    Google Scholar 

  7. C. D. Wagner, W. M Riggs, L. E. Davis, J. F. Moulder and G. E. Muilenberg (eds), “Handbook of x-ray photoelectron spectroscopy” (Perkin-Elmer, 1978), p. 104.

  8. W. Bienvogel and B. Hasler, Solid State Technol. 26 (1983) 125.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Semiconductor Division, Electronics and Telecommunications Research Institute, Yusong, P.O. Box 106, Taejon, 305–600, Korea

    K.-H. Baek, S. J. Yun, J.-M. Park, Y.-S. Yoon & K.-S. Nam

  2. Department of Electrical Engineering, Hanseo University, 360, Daegok-ri, Haemi-myun, Seosan-si, Chung-Nam, 356–820, Korea

    K.-H. Kwon & C.-I. Kim

Authors
  1. K.-H. Baek
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. S. J. Yun
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. J.-M. Park
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Y.-S. Yoon
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. K.-S. Nam
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. K.-H. Kwon
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. C.-I. Kim
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Baek, KH., Yun, S.J., Park, JM. et al. The Role of Sulfur During Mo Etching Using SF6 and Cl2 Gas Chemistries. Journal of Materials Science Letters 17, 1483–1486 (1998). https://doi.org/10.1023/A:1026434619677

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1026434619677

Keywords

Search

Navigation