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Variations in microstructure and composition of indium tin oxide films with the deposition technique

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Abstract

Indium tin oxide (ITO) films have been deposited by reactive d.c.-sputtering and also by the reactive thermal evaporation technique onto glass substrates. The relationship between the microstructure and composition of the ITO films was found to strongly depend on the deposition technique. In addition the application of pure water vapour as the reactive sputtering atmosphere and its influence on the structural and compositional properties of the ITO films has been studied.

X-ray diffraction investigations showed that all the films exhibited the bixbite structure of In2O3. No other crystalline phases were observed. Highly crystallized ITO films have been obtained using the reactive thermal evaporation technique. These films show a large average grain size of about 80 nm and a very homogeneous morphology. In contrast the d.c.-sputtered ITO films have a smaller average grain size and a characteristic texture. All deposited ITO films show an enlarged lattice constant compared to that of In2O3. A strong dependence of the chemical composition of the ITO films on the deposition technique and parameters was detected.

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Author notes

  1. M. Rottmann

    Present address: Siemens Matsushita Components, OFW FP PT, Postfach 80 17 09, 81617, München, Germany

Authors and Affiliations

  1. Institut für Physikalische und Theoretische Chemie, Humboldt-Universität zu Berlin, Bunsenstraße 1, D-10117, Berlin, Germany

    M. Rottmann, H. Hennig, B. Ziemer, R. Kalähne & K. H. Heckner

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  1. M. Rottmann
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  2. H. Hennig
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  3. B. Ziemer
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  4. R. Kalähne
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  5. K. H. Heckner
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Rottmann, M., Hennig, H., Ziemer, B. et al. Variations in microstructure and composition of indium tin oxide films with the deposition technique. JOURNAL OF MATERIALS SCIENCE 31, 6495–6500 (1996). https://doi.org/10.1007/BF00356253

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  • DOI: https://doi.org/10.1007/BF00356253

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