Abstract
Hull cells are often used to determine the optimum current density range for industrial electroplating. However, these cells do not reproduce correctly the hydrodynamic conditions. The design and the use of a modified Hull cell able to reproduce constant hydrodynamic conditions at the cathode for a large range of circulation speeds are described. Mass transfer and current distribution at the cathode have been evaluated in this cell for copper and zinc deposition.
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References
H. L. Pinkerton, ‘Current and Metal Distribution’ in‘Electroplating Engineering Handbook’ (edited by L. J. Durney), 4th edn. Van Nostrand Reinhold, New York (1984) pp. 461–73.
N. Ibl, Surf. Technol. 10 (1980) 81.
Norm 50957 DIN, ‘Galvanisierungsprüfung mit der Hull-Zelle’, TAB 175, Beuth Verlag GmbH, Berlin and Köln (1983).
M. Matlosz, C. Creton, C. Clerc and D. Landolt, J. Electrochem. Soc. 134 (1987) 3015.
D. Pletcher and F. C. Walsh, ‘Industrial Electrochemistry’, 2nd edn., Chapman & Hall, London and New York (1990) pp. 389–91.
R. H. Rousselot, Metal Finish. 57 (1959) 56.
B. M. Luce, ‘Current Distribution and Plating Tests’ in ‘Electroplaters' Process Control Handbook’ (edited by D. G. Foulke) Robert E. Krieger, Huntington, New York (1975) pp. 113–32.
R. Terakado and H. Nagasaka, Metal Finish. 77 (1979) 17.
W. R. Parrish and J. Newman, J. Electrochem. Soc. 116 (1969) 169.
, 117 (1970) 43.
J. Newman, 113 (1966) 1235.
R. V. Homsy and J. Newman, 121 (1974) 1448.
H. M. Wang, S. F. Chen, T. J. O'Keefe, M. Degrez and R. Winand, J. Appl. Electrochem. 19 (1989) 174.
A. Tvarusko and L. S. Watkins, Electrochim. Acta 14 (1969) 1109.
, J. Electrochem. Soc. 118 (1971) 580.
M. Degrez and R. Winand, Electrochim. Acta 29 (1984) 365.
D. J. Pickett, ‘Mass Transfer Design Equations For Electrochemical Reactors’ in ‘Electrochemical Reactor Design’ 2nd edn., Elsevier, Amsterdam and Oxford (1979) pp. 121–70.
D. J. Pickett and K. Ong, Electrochim. Acta 19 (1974) 875.
M. Degrez, A. A. Rodriguez Fajardo and R. Winand, Oberfläche/Surface 30 (1989–8) 20, (1989–9) 14.
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Degrez, M., Duchêne, A., Fontana, A. et al. A modified Hull cell with forced electrolyte flow: simulation of industrial electroplating conditions. J Appl Electrochem 23, 1285–1292 (1993). https://doi.org/10.1007/BF00234814
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DOI: https://doi.org/10.1007/BF00234814