Abstract
In this paper we have studied the island formation during InAs/Si(100) three dimensional (3D) heteroepitaxial growth using RHEED, SEM and TEM methods. We have found the strong influence of the growth conditions on the surface morphology. Both kinetic and energetic parameters play an important role during the growth in InAs/Si system. Dislocation-free InAs islands are formed at the Si(100) when lateral size is less then 5 nm.
Similar content being viewed by others
References
N. Kirstaedter, O.G. Schmidt, N.N. Ledentsov, D. Bimberg, U. Richter, S.S. Ruvimov, J. Heydenreich, V.M. Ustinov, M.V. Maximov, P.S. Kop’ev, and Zh.I. Alferov: Electron. Lett.30 (1994) 1416.
D. Bimberg, N.N. Ledentsov, M. Grundmann, N. Kirstaedter, O.G. Schmidt, M.H. Mao, V.M. Ustinov, A.Yu. Egorov, A.E. Zhukov, P.S. Kop’ev, Zh.I. Alferov, S.S. Ruvimov, U. Gösele, and J. Heydenreich: Jpn. J. Appl. Phys.35 (1996) 1311.
N.N. Ledentsov: inFuture Trends in Microelectronics (Eds. S. Luryi, J. Xu, and A. Zaslavsky), Wiley & S., 1999.
H. Ennen, J. Shneider, G. Pomeranke, and A. Axmann: Appl. Phys. Lett.43 (1983) 943.
T. Kimura, A. Yokoi, Y. Nishida, R. Saito, S. Yugo, and T. Ikoma: Appl. Phys. Lett.63 (1983) 2687.
S. Nomura, T. Iittaka, X. Zhao, T. Sugano, and Y. Aoyagi: Phys. Rev. B56 (1997) R4348.
N.N. Ledentsov: inProc. 23rd Int. Conf. on Phys. Semicond. (Eds. M. Scheffler and R. Zimmermann), World Scientific, Singapore, 1996, p. 19.
G.E. Cirlin, V.N. Petrov, V.G. Dubrovskii, S.A. Maslov, A.O. Golubok, N.I. Komyak, N.N. Ledentsov, Zh.I. Alferov, and D. Bimberg: Tech. Phys. Lett.24 (1998) 290.
G.E. Cirlin, V.G. Dubrovskii, V.N. Petrov, N.K. Polyakov, N.P. Korneeva, S.A. Maslov, V.N. Demidov, A.O. Golubok, D.V. Kurochkin, O.M. Gorbenko, N.I. Komyak, M. Ustinov, A.Yu. Egorov, A.R. Kovsh, M.V. Maximov, A.F. Tsatsul’nikov, B.V. Volovik, A.E. Zhukov, P.S. Kop’ev, Zh.I. Alferov, N.N. Ledentsov, M. Grundmann, and D. Bimberg: Semicond. Sci. Technol.13 (1998) 1262.
A.F. Tsatsul’nikov, A.Yu. Egorov, P.S. Kop’ev, A.R. Kovsh, M.V. Maximov, N.A. Bert, V.M. Ustinov, B.V. Volovik, A.E. Zhukov, Zh.I. Alferov, G.E. Cirlin, A.O. Golubok, S.A. Maslov, V.N. Petrov, N.N. Ledentsov, R. Heitz, M. Grundmann, D. Bimberg, I.P. Soshnikov, P. Werner, and U. Gösele: inProc. 24th Int. Conf. on Phys. Semicond. (Ed. D. Gershoni), World Scientific, Singapore, 1998, in press.
R. Heitz, N.N. Ledentsov, D. Bimberg, A.Yu. Egorov, M.V. Maximov, V.M. Ustinov, A.E. Zhukov, Zh.I. Alferov, G.E. Cirlin, I.P. Soshnikov, N.D. Zakharov, P. Werner, and U. Gösele: Appl. Phys. Lett.74 (1999) 1701.
A. Ishisaka and Y. Shiraki: J. Electrochem. Soc.133 (1998) 666.
G.M. Guryanov, V.N. Demidov, N.P. Korneeva, V.N. Petrov, Yu.B. Samsonenko, and G.E. Tsyrlin: Tech. Phys.42 (1997) 956.
G.E. Tsyrlin, N.P. Korneeva, V.N. Demidov, N.K. Polyakov, V.N. Petrov, and N.N. Ledentsov: Semiconductors31 (1997) 1057.
T. Mano, H. Fujioka, K. Ono, Y. Watanabe, and M. Oshima: Appl. Surf. Sci.130/132 (1998) 760.
Author information
Authors and Affiliations
Additional information
This work was partially supported by INTAS Grant No 96-0242, RFBR Grant No 98-02-18317 and Grant No 99-02-16799, Scientific Programmes “Physics of Solid State nanostructures” Grant No 98-2029 and “Methods and Devices of Micro- and Nanoelectronics” Grant No 02.04.5.1.40.E.46. G.E. Cirlin and B.V. Volovik are grateful to the INTAS Young Scientists Fellowship (Grant No 98-54 and No 98-41, respectively).
Rights and permissions
About this article
Cite this article
Cirlin, G.E., Polyakov, N.K., Petrov, V.N. et al. Effect of growth conditions on InAs nanoislands formation on Si(100) surface. Czech J Phys 49, 1547–1552 (1999). https://doi.org/10.1023/A:1022811613305
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1023/A:1022811613305