Abstract
A field effect transistor device (FET), consisting of a nonlinear Mott Insulator channel material, and a high dielectric-constant gate oxide, is explored as a nanoscale device. Experimental functionality of a large scale prototype (5 μm channel length) has been demonstrated. The underlying physics of the device is analyzed and modeled using a time-dependent Hartree approach. Timing estimates suggest a relatively short switching time.
Similar content being viewed by others
References
E.J. Lerner, IBM Research, (3), p.10 (1998); S. Thompson, P. Packan, and M. Bohr, Intel Technology Journal, Q3 1998, p.1.
E. Gusev, Ultrathin Oxide Films for Advance Gate Dielectric Approach: Current Progress and Future Challenges, this proceedings.
C. Zhou, D.M. Newns, J.A. Misewich, and P.C. Pattnaik, Appl. Phys. Lett. 70, 598 (1997); D.M. Newns, J. Misewich and C. Zhou, USA Patent disclosure #: Y0895–0318, 1996.
D.M. Newns, J.A. Misewich, C.C. Tsuei, A. Gupta, B.A. Scott, and A. Schrott, Appl. Phys. Lett. 73, 780 (1998).
N. Mott, Metal-Insulator Transitions, Taylor & Francis, London, 1990; Y. Tokura, Physica, C235–240, 138 (1994); T.V. Ramakrishnan, J. Solid State Chem., 111, 4 (1994), and references therein.
J. Mannhart, Supercond. Sci. Technol. (UK) 9, 49–67 (1996); V. Talyansky, S.B. Ogale, I. Takeuchi, C. Doughty, and T. Venkatesan, Phys. Rev., B53, 14575 (1996); T. Kawahara, T. Suzuki, E. Komai, K. Nakazawa, T. Terashima, and Y. Bando, Physica C 266, 149 (1996).
C.H. Ahn, J.-M. Triscone, N. Archibald, M. Decroux, R.H. Hammond, T.H. Geballe, Ø. Fischer, and M.R. Beasley, Science 269, 373 (1995); Y. Watanabe, Appl. Phys. Lett., 66, 1770 (1995); M.W.J. Prins, K.-O. Grosse-Holz, G. Müller, J.F.M. Cillesen, J.B. Giesbers, R.P. Weening and R.M. Wolf, Appl. Phys. Lett., 68, 3650 (1996); T. Venkatesan, Science, 276, 238 (1997).
T. Hato, A. Yoshida, C. Yoshida, H. Suzuki, and N. Yokoyama, Appl. Phys. Lett., 70, 2900 (1997).
A. Levy, J.P. Falck, M.A. Kastner, W.J. Gallagher, A. Gupta, and A.W. Kleinsasser, J. Appl. Phys., 69, 4439 (1991); A. Levy, J.P. Falck, M.A. Kastner, and R.J. Birgeneau, Phys. Rev., B51, 648 (1995); S. Hontsu, H. Tabata, N. Nakamori, J. Ishii, and T. Kawai, Jpn. J. Appl. Phys., 35, L774 (1996); S.B. Ogale, V. Talyansky, C.H. Chen, R. Ramesh, R.L. Greene, and T. Venkatesan, Phys. Rev. Lett., 77, 1159 (1996).
H. Takagi, B. Batlogg, H.L. Kao, J. Kwo, R.J. Cava, J.J. Krajewski, and W.F. Peck, Jr., Phys. Rev. Lett., 69, 2975 (1992).
Y. Taur, Y.J. Mii, D.J. Franck, H.S.J. Wong, D.A. Buchanan, S.J. Wind, S.A. Rishton, G.A. Sai Halasz, and E. Nowak, IBM J. Res. Develop., 39, 245 (1995).
C. Zhou and D.M. Newns, J. Appl. Phys., 82, 3081 (1997).
M. Izuha, K. Abe, and N. Fukushima, Jpn. J. Appl. Phys., 36, 5866 (1997).
T. Doderer, C.C. Tsuei, W. Hwang, and D.M. Newns, Charge transport in the normal state of electron or hole doped Y Ba 2 Cu 3 O 7-x, preprint.
D.M. Newns, USA Patent disclosure #: Y0998–175, (1998).
H.-M. Christen, J. Mannhart, E.J. Williams, and Ch. Gerber, Phys. Rev., B49, 12095 (1994); K. Abe and S. Komatsu, Jpn. J. Appl. Phys., 32, L1157 (1993); T. Hirano, M. Ueda, K, Matsui, T. Fujii, K. Sakuta, and T. Kobayashi, Jpn. J. Appl. Phys., 31, Pt. 2, L1346 (1992).
T. Mitsui, An introduction to the Physics of Ferroelectrics (Gordon and Breach, New York, 1976).
D.M. Newns, W.M. Donath, and P.C. Pattnaik, Performance simulations for a simple model of the all-oxide field effect transistor, preprint.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Newns, D., Doderer, T., Tsuei, C. et al. The Mott Transition Field Effect Transistor: A Nanodevice?. Journal of Electroceramics 4, 339–344 (2000). https://doi.org/10.1023/A:1009914609532
Issue Date:
DOI: https://doi.org/10.1023/A:1009914609532