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The Mott Transition Field Effect Transistor: A Nanodevice?

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Abstract

A field effect transistor device (FET), consisting of a nonlinear Mott Insulator channel material, and a high dielectric-constant gate oxide, is explored as a nanoscale device. Experimental functionality of a large scale prototype (5 μm channel length) has been demonstrated. The underlying physics of the device is analyzed and modeled using a time-dependent Hartree approach. Timing estimates suggest a relatively short switching time.

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References

  1. E.J. Lerner, IBM Research, (3), p.10 (1998); S. Thompson, P. Packan, and M. Bohr, Intel Technology Journal, Q3 1998, p.1.

  2. E. Gusev, Ultrathin Oxide Films for Advance Gate Dielectric Approach: Current Progress and Future Challenges, this proceedings.

  3. C. Zhou, D.M. Newns, J.A. Misewich, and P.C. Pattnaik, Appl. Phys. Lett. 70, 598 (1997); D.M. Newns, J. Misewich and C. Zhou, USA Patent disclosure #: Y0895–0318, 1996.

    Google Scholar 

  4. D.M. Newns, J.A. Misewich, C.C. Tsuei, A. Gupta, B.A. Scott, and A. Schrott, Appl. Phys. Lett. 73, 780 (1998).

    Google Scholar 

  5. N. Mott, Metal-Insulator Transitions, Taylor & Francis, London, 1990; Y. Tokura, Physica, C235–240, 138 (1994); T.V. Ramakrishnan, J. Solid State Chem., 111, 4 (1994), and references therein.

    Google Scholar 

  6. J. Mannhart, Supercond. Sci. Technol. (UK) 9, 49–67 (1996); V. Talyansky, S.B. Ogale, I. Takeuchi, C. Doughty, and T. Venkatesan, Phys. Rev., B53, 14575 (1996); T. Kawahara, T. Suzuki, E. Komai, K. Nakazawa, T. Terashima, and Y. Bando, Physica C 266, 149 (1996).

    Google Scholar 

  7. C.H. Ahn, J.-M. Triscone, N. Archibald, M. Decroux, R.H. Hammond, T.H. Geballe, Ø. Fischer, and M.R. Beasley, Science 269, 373 (1995); Y. Watanabe, Appl. Phys. Lett., 66, 1770 (1995); M.W.J. Prins, K.-O. Grosse-Holz, G. Müller, J.F.M. Cillesen, J.B. Giesbers, R.P. Weening and R.M. Wolf, Appl. Phys. Lett., 68, 3650 (1996); T. Venkatesan, Science, 276, 238 (1997).

    Google Scholar 

  8. T. Hato, A. Yoshida, C. Yoshida, H. Suzuki, and N. Yokoyama, Appl. Phys. Lett., 70, 2900 (1997).

    Google Scholar 

  9. A. Levy, J.P. Falck, M.A. Kastner, W.J. Gallagher, A. Gupta, and A.W. Kleinsasser, J. Appl. Phys., 69, 4439 (1991); A. Levy, J.P. Falck, M.A. Kastner, and R.J. Birgeneau, Phys. Rev., B51, 648 (1995); S. Hontsu, H. Tabata, N. Nakamori, J. Ishii, and T. Kawai, Jpn. J. Appl. Phys., 35, L774 (1996); S.B. Ogale, V. Talyansky, C.H. Chen, R. Ramesh, R.L. Greene, and T. Venkatesan, Phys. Rev. Lett., 77, 1159 (1996).

    Google Scholar 

  10. H. Takagi, B. Batlogg, H.L. Kao, J. Kwo, R.J. Cava, J.J. Krajewski, and W.F. Peck, Jr., Phys. Rev. Lett., 69, 2975 (1992).

    Google Scholar 

  11. Y. Taur, Y.J. Mii, D.J. Franck, H.S.J. Wong, D.A. Buchanan, S.J. Wind, S.A. Rishton, G.A. Sai Halasz, and E. Nowak, IBM J. Res. Develop., 39, 245 (1995).

    Google Scholar 

  12. C. Zhou and D.M. Newns, J. Appl. Phys., 82, 3081 (1997).

    Google Scholar 

  13. M. Izuha, K. Abe, and N. Fukushima, Jpn. J. Appl. Phys., 36, 5866 (1997).

    Google Scholar 

  14. T. Doderer, C.C. Tsuei, W. Hwang, and D.M. Newns, Charge transport in the normal state of electron or hole doped Y Ba 2 Cu 3 O 7-x, preprint.

  15. D.M. Newns, USA Patent disclosure #: Y0998–175, (1998).

  16. H.-M. Christen, J. Mannhart, E.J. Williams, and Ch. Gerber, Phys. Rev., B49, 12095 (1994); K. Abe and S. Komatsu, Jpn. J. Appl. Phys., 32, L1157 (1993); T. Hirano, M. Ueda, K, Matsui, T. Fujii, K. Sakuta, and T. Kobayashi, Jpn. J. Appl. Phys., 31, Pt. 2, L1346 (1992).

    Google Scholar 

  17. T. Mitsui, An introduction to the Physics of Ferroelectrics (Gordon and Breach, New York, 1976).

    Google Scholar 

  18. D.M. Newns, W.M. Donath, and P.C. Pattnaik, Performance simulations for a simple model of the all-oxide field effect transistor, preprint.

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Newns, D., Doderer, T., Tsuei, C. et al. The Mott Transition Field Effect Transistor: A Nanodevice?. Journal of Electroceramics 4, 339–344 (2000). https://doi.org/10.1023/A:1009914609532

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  • DOI: https://doi.org/10.1023/A:1009914609532

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