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Pulsed laser deposition of metals in various inert gas atmospheres

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Abstract

The changes in the properties of laser deposited metal thin films were investigated in different inert gas atmospheres (He, Ne, Ar and Xe). With increasing inert gas pressure, the reduction of particle energy is accompanied by a strong increase of the deposition rate (especially in He atmosphere), a transition from compressive to tensile stress, and changes in structure and texture. This is explained by a reduction of surface mobility of the deposited particles, a decrease of implantation, resputtering and shot-peening effects. At high gas pressures, deposition conditions similar to sputtering or even thermal deposition are obtained.

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Authors and Affiliations

  1. Institut für Materialphysik, University of Göttingen, Tammannstrasse 1, 37077, Göttingen, Germany

    T. Scharf, J. Faupel, K. Sturm & H.-U. Krebs

  2. Nanofilm Technologie GmbH, Anna-Vanderhoeck-Ring 5, 37081, Göttingen, Germany

    K. Sturm

Authors
  1. T. Scharf
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  2. J. Faupel
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  3. K. Sturm
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  4. H.-U. Krebs
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Corresponding author

Correspondence to T. Scharf.

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PACS

68.55.-a; 81.15.Fg

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Scharf, T., Faupel, J., Sturm, K. et al. Pulsed laser deposition of metals in various inert gas atmospheres. Appl. Phys. A 79, 1587–1589 (2004). https://doi.org/10.1007/s00339-004-2855-z

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  • DOI: https://doi.org/10.1007/s00339-004-2855-z

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