Improvement of Rinsing Efficiency after Sulfuric Acid Hydrogen Peroxide Mixture (H2SO4/H2O2) by HF Addition

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Copyright (c) 1996 The Japan Society of Applied Physics
, , Citation Rochdi Messoussi et al 1996 Jpn. J. Appl. Phys. 35 1989 DOI 10.1143/JJAP.35.1989

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1 Department of Electronic Engineering, Faculty of Engineering, Tohoku University, Aza-Aoba, Aramaki,

2 Aoba-ku, Sendai 980-77, Japan

3 Institute of Electrical Communication, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-77, Japan

Dates

  1. Received 31 October 1994
  2. Accepted 1 February 1996

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1347-4065/35/4R/1989

Abstract

We report on the improvement in efficiency of deionized water rinsing after using a H2SO4/H2O2/HF mixture which produces hydrophobic Si surfaces by means of fluorine passivation, providing better sulfur removal and shorter rinsing time than the conventional H2SO4/H2O2 mixture. After removing this passivation agent by rinsing in deionized water, the surfaces are still covered with chemical oxide, which protects them from organic contamination. Furthermore this treatment does not induce surface roughening.

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10.1143/JJAP.35.1989