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Title:
Development of a new technique for high-energy secondary-electron measurements in plasma immersion ion implantation
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Plasma Sources Science & Technology [0963-0252] Nakamura, K yr:1997
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Nakamura, K
Mändl, S
Brutscher, J
Günzel, R
Möller, W
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Mändl, S
Brutscher, J
Günzel, R
Möller, W
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Mändl, S
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Möller, W
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