Nernst and Ettingshausen Effects in Silicon between 300°K and 800°K

Herbert Mette, Wolfgang W. Gärtner, and Claire Loscoe
Phys. Rev. 117, 1491 – Published 15 March 1960
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Abstract

The Nernst and Ettingshausen coefficients in p-type silicon single crystals of various impurity densities have been measured over a temperature range between 300°K and 800°K at magnetic fields of 9000 gauss. The results are in good agreement with the theoretical predictions. Using the measured coefficients in the Bridgman relation, values were obtained for the thermal conductivity of silicon in the temperature range between 550°K and 800°K.

  • Received 13 October 1959

DOI:https://doi.org/10.1103/PhysRev.117.1491

©1960 American Physical Society

Authors & Affiliations

Herbert Mette, Wolfgang W. Gärtner, and Claire Loscoe

  • U. S. Army Signal Research and Development Laboratory, Fort Monmouth, New Jersey

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Issue

Vol. 117, Iss. 6 — March 1960

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