Language
English
German
^M
Dutch
Spanish
Title:
Characterization of an imploding cylindrical plasma for electron transport studies using x-ray emission spectroscopy
Source:
Physics of Plasmas [1070-664X] Dozières, M yr:2020
Basic
Full text
Full text available via
AIP Journals (American Institute of Physics)
Year:
Volume:
Issue:
Start Page:
Document delivery
Request document via
Library/Bibliothek
Users interested in this article also expressed an interest in the following:
description
1.
Zhu, X.
"Optical emission spectroscopy in low-temperature plasmas containing argon and nitrogen : Determination of the electron temperature and density by the line-ratio method."
Journal of physics. D, Applied physics
43.40 (2010): 403001-.
description
2.
Qayyum, A.
"Diagnostics of nitrogen plasma by trace rare-gas-optical emission spectroscopy."
Journal of applied physics
98.10 (2005): 103303-103311.
description
3.
Zhu, X.
"Spatial evolution of the electron energy distribution function in a low-pressure capacitively coupled plasma containing argon and krypton."
Plasma sources science & technology
21.4 (2012): 45009-.
description
4.
Keller, S.
"Characterization of transient discharges under atmospheric-pressure conditions applying nitrogen photoemission and current measurements."
Journal of physics. D, Applied physics
45.12 (2012): 125202-.
description
5.
Kimura, T.
"Experiments and global model of inductively coupled rf Ar/N2 discharges."
Journal of applied physics
108.3 (2010): 33305-33313.
description
6.
Surendra, M.
"Across wafer etch rate uniformity in a high density plasma reactor: Experiment and modeling."
Applied physics letters
66.18 (1995): 2415-2417.
description
7.
Xin, Y.
"Optical emission study of CH4+ CHF3 ECR plasma and properties of aC: F: H films."
Surface & coatings technology
173.2-3 (2003): 172-177.
description
8.
Sourd, B.
"Influence of the excited states of atomic nitrogen N(2D), N(2P) and N(R) on the transport properties of nitrogen. Part II. Nitrogen plasma properties."
Plasma chemistry and plasma processing
27.2 (2007): 225-240.
description
9.
Takechi, K.
"Effect of Ar addition to an O-2 plasma in an inductively coupled, traveling wave driven, large area plasma source: O-2/Ar mixture plasma modeling and photoresist etching."
Journal of applied physics
90.7 (2001): 3205-3211.
description
10.
S Dine J-P Booth G A Curley C S Corr J Jolly J Gui, S.
"A novel technique for plasma density measurement using surface-wave transmission spectra."
Plasma sources science & technology
14.4: 777-786.
description
11.
Yanguas-Gil, A.
"Measuring the electron temperature by optical emission spectroscopy in two temperature plasmas at atmospheric pressure: A critical approach."
Journal of applied physics
99.3 (2006): 33104-.
description
12.
"A general simulator for VLSI lithography and etching processes: Part II."
IEEE transactions on electron devices
27.8: 1455-1459.
description
13.
Michael, CA.
"Dual view FIDA measurements on MAST."
Plasma Physics and Controlled Fusion
55.9 (2013): 95007-18.
description
14.
Singh, T.P..
"Optimization of the deposition parameters of DLC coatings with the IC-PECVD method."
Particulate science and technology
33.2 (2015): 119-123.
description
15.
Bai, Y.
"Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon."
Plasma science & technology
15.10 (2013): 1002-1005.
description
16.
Lapke, M.
"Modeling and simulation of the plasma absorption probe."
Applied physics letters
90.12 (2007): 121502-.
description
17.
Xin, Y.
"Structural evolution of a-C:F:H film prepared by microwave ECR CVD."
Surface & coatings technology
149.1 (2002): 89-94.
description
18.
Ito, H.
"Sticking probability of CN(X-2 Sigma(+)) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar."
Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy
86 (2012): 256-265.
description
19.
Shen, B.
"Influence of different buffer gases on synthesis of few-layered graphene by arc discharge method."
Applied surface science
258.10 (2012): 4523-4531.
description
20.
Boris, D R.
"The LC resonance probe for determining local plasma density."
Plasma sources science & technology
20.2 (2011): 25003-.
View More...
View Less...
Select All
Clear All
Save Citations
Select Format
RefWorks
Reference Manager
EndNote
ProCite
Submit citation export
Advanced
Author
Other articles by this author? -- in
GeoRef
author:
Dozières, M
Hansen, S
Forestier Colleoni, P
McGuffey, C
Kawahito, D
Bailly Grandvaux, M
Bhutwala, K
Krauland, C M
Wei, M S
Gourdain, P
Davies, J R
Matsuo, K
Fujioka, S
Campbell, E M
Peebles, J L
Santos, J J
Batani, D
Zhang, S
Beg, F N
last name
initials
Other articles by this author? -- in
Online Contents Geosciences
author:
Dozières, M
Hansen, S
Forestier Colleoni, P
McGuffey, C
Kawahito, D
Bailly Grandvaux, M
Bhutwala, K
Krauland, C M
Wei, M S
Gourdain, P
Davies, J R
Matsuo, K
Fujioka, S
Campbell, E M
Peebles, J L
Santos, J J
Batani, D
Zhang, S
Beg, F N
last name
initials
Other articles by this author? -- using
Web of Science
author:
Dozières, M
Hansen, S
Forestier Colleoni, P
McGuffey, C
Kawahito, D
Bailly Grandvaux, M
Bhutwala, K
Krauland, C M
Wei, M S
Gourdain, P
Davies, J R
Matsuo, K
Fujioka, S
Campbell, E M
Peebles, J L
Santos, J J
Batani, D
Zhang, S
Beg, F N
last name
initials
Web Search
Find related information in
a Web Search Engine
Excite
Google
HotBot
Ixquick
ZOO
Ask
Yahoo!
Bing
Naver
Search Terms:
Search for related information in
Google Scholar
Article Title
Author Name
Journal Title
Other Search
Search Terms:
A service provided by the
Library of the Wissenschaftspark Albert Einstein
, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.