SFX by Ex Libris Inc.

Title:	Femtosecond laser-induced refractive index modification in multicomponent glasses
Source:	Journal of Applied Physics [0021-8979] Bhardwaj, V R yr:2005

Basic

Sorry, no full text available...

Please use the document delivery service (see below)

Holding information

Holdings in library search engine ALBERT

Document delivery

Request document via Library/Bibliothek

Users interested in this article also expressed an interest in the following:
description	1.	Berlich, R. "Spatially resolved measurement of femtosecond laser induced refractive index changes in transparent materials." Optics letters 37.14 (2012): 3003-5.
description	2.	Tung, K. "Polymeric optical waveguides using direct ultraviolet photolithography process." Applied physics. A, Materials science & processing 80.3 (2005): 621-626.
description	3.	Akcalt, E. "Cycle-time improvements for photolithography process in semiconductor manufacturing." IEEE transactions on semiconductor manufacturing 14.1 (2001): 48-56.
description	4.	Jiang, C. "Nonlinear response of a silicon waveguide enhanced by a metal grating." Applied optics 51.23 (2012): 5752-5757.
description	5.	Almeida, J M P M. "Generation of copper nanoparticles induced by fs-laser irradiation in borosilicate glass." Optics express 20.14 (2012): 15106-13.
description	6.	Jiang, L. "Prediction of crater shape in femtosecond laser ablation of dielectrics." Journal of physics. D, Applied physics 37.10 (2004): 1492-1496.
description	7.	Sum, T. "Proton beam writing of low-loss polymer optical waveguides." Applied physics letters 83.9 (2003): 1707-1709.
description	8.	Lin, S.-Y. Y. "Three-dimensional photonic-crystal emission through thermal excitation." Optics letters 28.20 (2003): 1909-1911.
description	9.	Arisha, A. "A simulation model to characterize the photolithography process of a semiconductor wafer fabrication." Journal of materials processing technology 155.1 (2004): 2071-2079.
description	10.	Starr, A. "Fabrication and characterization of a negative-refractive-index composite metamaterial." Physical review. B, Condensed matter and materials physics 70.11 (2004): 113102-4.
description	11.	Abdallah, J. "UV-induced porosity using photogenerated acids to catalyze the decomposition of sacrificial polymers templated in dielectric." Journal of materials chemistry 17.9 (2007): 873-885.
description	12.	Jiang, S. "Ultra-short laser ablation of dielectrics: Theoretical analysis of threshold damage fluence and ablation depth." Applied surface science 256.1 (2009): 130-135.
description	13.	Asuncion, Michael Z. Z. "Silsesquioxane barrier materials." Macromolecules 40.3 (2007): 555-562.
description	14.	"P-147: Organic Thin Film Transistors using Solution and Photolithography Process." Digest of technical papers. 46.1: 1750-1752.
description	15.	Choi, CG. "Fabrication of large-core 1 x 16 optical power splitters in polymers using hot-embossing process." IEEE Photonics Technology Letters 15.6 (2003): 825-827.
description	16.	He, L. "A novel photobleachable polysilane copolymer for optical waveguide fabrication." Polymers for advanced technologies 22.6 (2011): 1056-1059.
description	17.	Shih, H. "Prism-type holographic optical element design and verification for the blue-light small-form-factor optical pickup head." Applied optics 51.24 (2012): 5758-5766.
description	18.	Hoehm, S. "Femtosecond laser-induced periodic surface structures on silica." Journal of applied physics 112.1 (2012): 14901-.
description	19.	Beleites, M. "Near-field optical microscopy of femtosecond-laser-reshaped silver nanoparticles in dielectric matrix." Nanoscale Research Letters 7.1 (2012): 315-5.
description	20.	SHIMADA, H. "ADVANCED DEVELOPMENT PROCESS FOR ULTRA-FINE PHOTORESIST PATTERNS." IEEE transactions on semiconductor manufacturing 6.3 (1993): 269-273.