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Title:
Degradation mechanism of HfAlOX∕SiO2 stacked gate dielectrics studied by transient and steady-state leakage current analysis
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Journal of Applied Physics [0021-8979] Okada, Kenji yr:2005
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Author
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GeoRef
author:
Okada, Kenji
Mizubayashi, Wataru
Yasuda, Naoki
Ota, Hiroyuki
Tominaga, Koji
Iwamoto, Kunihiko
Horikawa, Tsuyoshi
Yamamoto, Katsuhiko
Hisamatsu, Hirokazu
Satake, Hideki
Nabatame, Toshihide
Toriumi, Akira
last name
initials
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Online Contents Geosciences
author:
Okada, Kenji
Mizubayashi, Wataru
Yasuda, Naoki
Ota, Hiroyuki
Tominaga, Koji
Iwamoto, Kunihiko
Horikawa, Tsuyoshi
Yamamoto, Katsuhiko
Hisamatsu, Hirokazu
Satake, Hideki
Nabatame, Toshihide
Toriumi, Akira
last name
initials
Other articles by this author? -- using
Web of Science
author:
Okada, Kenji
Mizubayashi, Wataru
Yasuda, Naoki
Ota, Hiroyuki
Tominaga, Koji
Iwamoto, Kunihiko
Horikawa, Tsuyoshi
Yamamoto, Katsuhiko
Hisamatsu, Hirokazu
Satake, Hideki
Nabatame, Toshihide
Toriumi, Akira
last name
initials
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