ExLibris header image
SFX Logo
Title: NiAi1.74Al0.26 and NiSi1.83Ga0.17: Two materials with perfect lattice match to Si
Source:

Applied Physics Letters [0003-6951] Richter, Klaus yr:2003


Collapse list of basic services Basic
Full text
Full text available via AIP Journals (American Institute of Physics)
GO
Document delivery
Request document via Library/Bibliothek GO
Users interested in this article also expressed an interest in the following:
1. Koh, A. "Nickel-aluminum alloy silicides with high aluminum content for contact resistance reduction and integration in n-channel field-effect transistors." Journal of the Electrochemical Society 155.3 (2008). Link to SFX for this item
2. Hirsch, F. "Influence of Al on the growth of NiSi2 on Si(001)." Microelectronic engineering 82.3-4 (2005): 474-478. Link to SFX for this item
3. Fang, Q. "High Efficiency Ring-Resonator Filter With NiSi Heater." IEEE Photonics Technology Letters 24.5 (2012): 350-352. Link to Full Text for this item Link to SFX for this item
4. Huang, W. "Effect of erbium interlayer on nickel silicide formation on Si(100)." Applied surface science 254.7 (2008): 2120-2123. Link to SFX for this item
5. Shin, M. "Computational study on the performance of multiple-gate nanowire schottky-barrier MOSFETs." IEEE transactions on electron devices 55.3 (2008): 737-742. Link to SFX for this item
6. Luo, J. "Silicidation of Ni(Yb) film on Si(001)." Journal of Electronic Materials 37.3 (2008): 245-248. Link to Full Text for this item Link to SFX for this item
7. Strain, M J. "Silicon micro-ring resonators with tunable Q-factor for ultra-low power parametric signal generation." 2013 Conference on Lasers&Electro-Optics Europe&International Quantum Electronics Conference CLEO EUROPE/IQEC (2013): 1-1. Link to SFX for this item
8. Ipser, H. "The Al-Ni-Si phase diagram. Part II: phase equilibria between 33.3 and 66.7 at.% Ni." Intermetallics 12.5 (2004): 545-554. Link to SFX for this item
9. Shubin, I. "Integration, processing and performance of low power thermally tunable CMOS-SOI WDM resonators." Optical and quantum electronics 44.12-13 (2012): 589-604. Link to Full Text for this item Link to SFX for this item
10. Alberti, A. "Schottky Barrier Inhomogeneities in Nickel Silicide Transrotational Contacts." Applied physics express 4.11 (2011): 115701-. Link to SFX for this item
11. Song, Jeong H. "Grating Coupler Embedded Silicon Platform for Hybrid Integrated Receivers." IEEE Photonics Technology Letters 24.3 (2012): 161-163. Link to Full Text for this item Link to SFX for this item
12. Benmaza, H. "Barrier height inhomogeneities in a Ni/SiC-6H Schottky n-type diode." Microelectronics journal 39.1 (2008): 80-84. Link to SFX for this item
13. Huang, Y. "Study of Ni/Si(100) solid-state reaction with Al addition." Applied surface science 254.17 (2008): 5631-5634. Link to SFX for this item
14. SVERDLOV, V. "Current transport models for nanoscale semiconductor devices." Materials science & engineering. R, Reports 58.6 (2008): 228-270. Link to SFX for this item
15. Indlekofer, Klaus M. "Understanding Coulomb Effects in Nanoscale Schottky-Barrier-FETs." IEEE transactions on electron devices 54.6 (2007): 1502-1509. Link to SFX for this item
View More...
View Less...
Select All Clear All

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.