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Title:
Degradation of polycrystalline HfO2-based gate dielectrics under nanoscale electrical stress
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Applied Physics Letters [0003-6951] Iglesias, V yr:2011
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author:
Iglesias, V
Lanza, M
Zhang, K
Bayerl, A
Porti, M
Nafría, M
Aymerich, X
Benstetter, G
Shen, Z Y
Bersuker, G
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author:
Iglesias, V
Lanza, M
Zhang, K
Bayerl, A
Porti, M
Nafría, M
Aymerich, X
Benstetter, G
Shen, Z Y
Bersuker, G
last name
initials
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author:
Iglesias, V
Lanza, M
Zhang, K
Bayerl, A
Porti, M
Nafría, M
Aymerich, X
Benstetter, G
Shen, Z Y
Bersuker, G
last name
initials
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