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Title:
Impact of gate materials on positive charge formation in HfO2∕SiO2 stacks
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Applied Physics Letters [0003-6951] Zhao, C Z yr:2006
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Zhao, C Z
Zhang, J F
Zahid, M B
Groeseneken, G
Degraeve, R
De Gendt, S
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Zhao, C Z
Zhang, J F
Zahid, M B
Groeseneken, G
Degraeve, R
De Gendt, S
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Zhao, C Z
Zhang, J F
Zahid, M B
Groeseneken, G
Degraeve, R
De Gendt, S
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