ExLibris header image
SFX Logo
Title: Growth, shrinkage, and stability of interfacial oxide layers between directly bonded silicon wafers
Source:

Applied Physics A - Materials Science & Processing [0947-8396] Ahn, K.-Y. yr:1990


Collapse list of basic services Basic
Full text
Full text available via SpringerLINK Contemporary 1997-Present
GO
Document delivery
Request document via Library/Bibliothek GO

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.