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Title:
Sub-quarter micron metallization using ionized metal plasma (IMP) technology
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Vacuum [0042-207X] Tanaka, Y yr:1998
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Tanaka, Y
Xu, Z
Gopalraja, P
Forster, J
Yao, G
Zhang, H
Nulman, J
Chen, F
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Xu, Z
Gopalraja, P
Forster, J
Yao, G
Zhang, H
Nulman, J
Chen, F
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Tanaka, Y
Xu, Z
Gopalraja, P
Forster, J
Yao, G
Zhang, H
Nulman, J
Chen, F
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