Detection of interlayer interaction in few-layer graphene

Zefei Wu, Yu Han, Jiangxiazi Lin, Wei Zhu, Mingquan He, Shuigang Xu, Xiaolong Chen, Huanhuan Lu, Weiguang Ye, Tianyi Han, Yingying Wu, Gen Long, Junying Shen, Rui Huang, Lin Wang, Yuheng He, Yuan Cai, Rolf Lortz, Dangsheng Su, and Ning Wang
Phys. Rev. B 92, 075408 – Published 6 August 2015
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Abstract

Bernal-stacked few-layer graphene has been investigated by analyzing its Landau-level spectra through quantum capacitance measurements. We find that surface relaxation, which is insignificant in trilayer graphene, starts to manifest in Bernal-stacked tetralayer graphene. In trilayer graphene, the interlayer interaction parameters are generally similar to those of graphite. However, in tetralayer graphene, the hopping parameters of the two bulk layers are quite different from those of the two outer layers. This represents direct evidence of the surface relaxation phenomenon. Traditionally, the van der Waals interaction between the carbon layers is thought to be insignificant. However, we suggest that the interlayer interaction is an important factor in explaining the observed results, and the symmetry-breaking effects in graphene sublattice are not negligible.

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  • Received 16 January 2015
  • Revised 6 June 2015

DOI:https://doi.org/10.1103/PhysRevB.92.075408

©2015 American Physical Society

Authors & Affiliations

Zefei Wu1,*, Yu Han1,*, Jiangxiazi Lin1,*, Wei Zhu2, Mingquan He1, Shuigang Xu1, Xiaolong Chen1, Huanhuan Lu1, Weiguang Ye1, Tianyi Han1, Yingying Wu1, Gen Long1, Junying Shen1, Rui Huang3, Lin Wang4, Yuheng He1, Yuan Cai1, Rolf Lortz1, Dangsheng Su5, and Ning Wang1,†

  • 1Department of Physics and the William Mong Institute of Nano Science and Technology, Hong Kong University of Science and Technology, Hong Kong, China
  • 2Department of Physics and Astronomy, California State University, Northridge, California 91330, USA
  • 3Department of Physics and Electronic Engineering, Hanshan Normal University, Chaozhou, China
  • 4Department of Condensed Matter Physics, Group of Applied Physics, University of Geneva, Switzerland
  • 5Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Shenyang, China

  • *These authors contributed equally to this paper.
  • Corresponding author: phwang@ust.hk

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Issue

Vol. 92, Iss. 7 — 15 August 2015

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